Patterning of material layers in submicron region /
Saved in:
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| Andre forfattere: | |
| Format: | Bog |
| Sprog: | English |
| Udgivet: |
New York :
J. Wiley,
1993.
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| Fag: | |
| Online adgang: | Table of Contents Publisher description |
Indholdsfortegnelse:
- I. Submicron Patterning: State of the Art and Vistas. 1. The Amelioration. 2. Prospective Avenues
- II. Electron Beam Lithography. 2. Electron Beam Sources. 3. Resists. 4. Technology. 5. EBL Applications
- 6. Conclusions and Trajections
- III. Ion Beam Lithography. 2. I-Beam Resists. 3. Exposure Techniques. 4. Focused Ion Beam Lithography (FIBL). 5. Parallel Processing with Ions. 6. Problems and Limitations in Ion Beam Lithography. 7. Applications of Ion Beam Lithography
- 8. Conclusions and Prenotations
- IV. X-Ray Lithography. 2. Principle. 3. X-Ray Sources. 4. Enlarging the Exposure Field. 5. Beamline for Synchrotron Radiation. 6. X-ray Masks. 7. X-Ray Resists. 8. Alignment Schemes. 9. X-Ray Lithography Systems. 10. Applications of X-Ray Lithography
- 11. Conclusion and Directions
- V. Nanotechnology: Present Day Scenario. 1. International Status. 2. Projections.