Patterning of material layers in submicron region /

Patterning of material layers in submicron region /

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Bibliographic Details
Main Author: Tandon, U. S., 1952-
Other Authors: Khokle, W. S.
Format: Book
Language:English
Published: New York : J. Wiley, 1993.
Subjects:
Integrated circuits > Masks.
Ion beam lithograph.
Lithography, Electron beam.
X-ray lithography.
Online Access:Table of Contents
Publisher description

Internet

Table of Contents
Publisher description

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