Database for and statistical analysis of the interlaboratory determination of the conversion coefficient for the measurement of the interstitial oxygen content of silicon by infrared absorption /
Gardado en:
Autor Corporativo: | |
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Outros autores: | , , |
Formato: | Libro |
Idioma: | English |
Publicado: |
Gaithersburg, Md. : Washington, DC :
U.S. Dept. of Commerce, National Institute of Standards and Technology ; For sale by the Supt. of Docs., U.S. G.P.O.,
1989.
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Series: | Semiconductor measurement technology
NIST special publication ; 400-82 |
Subjects: |
descrición da copia: | "July 1989." |
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Descrición Física: | x, 168 p. : ill. ; 28 cm. |
Bibliografía: | Includes bibliographical references. |