Database for and statistical analysis of the interlaboratory determination of the conversion coefficient for the measurement of the interstitial oxygen content of silicon by infrared absorption /
Sábháilte in:
Údar corparáideach: | |
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Rannpháirtithe: | , , |
Formáid: | LEABHAR |
Teanga: | English |
Foilsithe / Cruthaithe: |
Gaithersburg, Md. : Washington, DC :
U.S. Dept. of Commerce, National Institute of Standards and Technology ; For sale by the Supt. of Docs., U.S. G.P.O.,
1989.
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Sraith: | Semiconductor measurement technology
NIST special publication ; 400-82 |
Ábhair: |
Cur síos ar an mír: | "July 1989." |
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Cur síos fisiciúil: | x, 168 p. : ill. ; 28 cm. |
Leabharliosta: | Includes bibliographical references. |