Photoelasticity : proceedings of the international symposium held at Illinois Institute of Technology, October 1961 /

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Bibliographic Details
Corporate Authors: International Symposium on Photoelasticity Chicago, Illinois Institute of Technology
Other Authors: Frocht, Max Mark
Format: Conference Proceeding Book
Language:English
Published: Oxford : Pergammon, 1963.
Subjects:
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111 2 |a International Symposium on Photoelasticity  |d (1961 :  |c Chicago) 
245 1 0 |a Photoelasticity :  |b proceedings of the international symposium held at Illinois Institute of Technology, October 1961 /  |c edited by M.M. Frocht. 
260 |a Oxford :  |b Pergammon,  |c 1963. 
300 |a xxi, 294 p. :  |b ill. ;  |c 24 cm. 
500 |a Sponsored by U.S. Army Research Office, National Science Foundation and Illinois Institute of Technology. 
504 |a Includes bibliographies. 
650 0 |a Photoelasticity. 
700 1 |a Frocht, Max Mark. 
710 2 |a Illinois Institute of Technology 
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