Photoelasticity : proceedings of the international symposium held at Illinois Institute of Technology, October 1961 /

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Bibliographic Details
Corporate Authors: International Symposium on Photoelasticity Chicago, Illinois Institute of Technology
Other Authors: Frocht, Max Mark
Format: Conference Proceeding Book
Language:English
Published: Oxford : Pergammon, 1963.
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Description
Item Description:Sponsored by U.S. Army Research Office, National Science Foundation and Illinois Institute of Technology.
Physical Description:xxi, 294 p. : ill. ; 24 cm.
Bibliography:Includes bibliographies.