Introduction to microlithography : theory, materials, and processing /

Introduction to microlithography : theory, materials, and processing /

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Библиографические подробности
Корпоративные авторы: American Chemical Society. Division of Organic Coatings and Plastics Chemistry, American Chemical Society. Meeting
Другие авторы: Thompson, L. F., 1944-, Willson, C. G. (C. Grant), 1939-, Bowden, M. J., 1943-
Формат: ‌
Язык:English
Опубликовано: Washington, D.C. : The Society, 1983.
Серии:ACS symposium series ; 219.
Предметы:
Microlithography > Congresses.
Photoresists > Congresses.
Plasma etching > Congresses.
Semiconductors > Etching > Congresses.
Оглавление:
  • An introduction to lithography / L.F. Thompson
  • The lithographic process--the physics / L.F. Thompson and M.J. Bowden
  • Organic resist materials--theory and chemistry / C. Grant Willson
  • Resist processing / L.F. Thompson and M.J. Bowden
  • Plasma etching / J.A. Mucha and D.W. Hess
  • Multi-layer resist systems / B.J. Lin.

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